Molybdenum

Molybdenum substrate

Material: Molybdenum 361
Purity: ≥99.95%
Technics: rolling, wire-electrode cutting, machining
Dimension: Customization
Application: Discover high-quality MBE molybdenum substrates, specifically designed for Molecular Beam Epitaxy (MBE) applications. Our molybdenum substrates feature excellent thermal conductivity, high purity, and
INQUIRY

1. Product Overview

The MBE (Molecular Beam Epitaxy) molybdenum substrate is a critical component designed for high-precision thin-film growth processes. It is widely used in semiconductors, optoelectronic materials, quantum devices, and other fields. With its excellent thermal stability, high purity, and superior mechanical properties, the molybdenum substrate is an indispensable core component in MBE equipment.

2. Product Features

High Melting Point: Molybdenum has a melting point of up to 2620°C, making it suitable for high-temperature epitaxial growth environments.
Excellent Thermal Conductivity: Ensures uniform temperature distribution on the substrate surface, preventing localized overheating.
High Purity: Made from high-purity molybdenum, reducing impurity contamination and improving thin-film quality.
Good Mechanical Strength: Maintains stability under high-stress conditions, extending service life.
Corrosion Resistance: Performs well in ultra-high vacuum and chemically active environments.
Customizable Design: Available in various sizes, shapes, and surface treatments to meet customer requirements.

3. Application Fields

Semiconductor Manufacturing: Used for molecular beam epitaxial growth of materials such as GaAs, GaN, and SiC.
Optoelectronic Materials: Used for epitaxial growth of optoelectronic devices like lasers and detectors.
Quantum Devices: Used for epitaxial growth of nanostructures such as quantum dots and quantum wells.
Scientific Research: Suitable for high-precision thin-film growth and new material research.

4. Technical Parameters

Material: High-purity molybdenum (Mo)
Melting Point: 2620°C
Thermal Conductivity: 138 W/m·K
Density: 10.2 g/cm3
Purity: ≥99.95%
Dimensions: Customizable (diameter, thickness, etc.)
Surface Treatment: Customizable options such as polishing and coating.

5. Product Advantages

High Performance: Maintains stability under high-temperature and ultra-high vacuum conditions, ensuring epitaxial growth quality.
Long Service Life: Resistant to high temperatures and corrosion, reducing equipment downtime and maintenance costs.
High Precision: High surface flatness ensures uniform thin-film growth.
Customization Services: Provides personalized design and manufacturing services based on customer needs.
Quality After-Sales Service: Offers comprehensive technical support and maintenance services.

6. Usage and Maintenance

Installation: Ensure the substrate matches the equipment to avoid mechanical stress.
Cleaning: Regularly remove surface contaminants to maintain high purity and performance.
Inspection: Periodically check for wear and corrosion, and replace or maintain as needed.

7. Compatible Equipment

MBE (Molecular Beam Epitaxy) Equipment
Ultra-High Vacuum Thin-Film Deposition Equipment
Other High-Precision Epitaxial Growth Equipment

The MBE molybdenum substrate, with its excellent performance and reliability, plays a vital role in semiconductors, optoelectronic materials, quantum devices, and other fields. Whether for large-scale production or scientific research, the molybdenum substrate provides efficient and stable support, making it a core component in MBE equipment.

For more information or customization services, please contact our sales team. We will provide professional solutions and high-quality services!

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